Ion plating is a PVD process that uses reactive electron beam evaporation. While sputtering uses bombardment with argon ions to remove coating material from a metal plate, in ion plating, the metallic component of the coating material (e.g. titanium or chromium) is evaporated by a low-voltage arc.
1 Electron beam source
2 Argon
3 Reactive gas
4 Components
5 Coating material
6 Crucible (anode)
7 Low-voltage arc discharge
8 Vacuum pump
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