PACVD
PACVD = Plasma-Assisted Chemical Vapour Deposition

                
To produce metal-free carbon coatings, Oerlikon Balzers Coating uses the high-frequency PACVD process.

The setup used in this process is similar to that for sputtering. But after sputtering a metallic adhesion film, a high-frequency AC voltage is applied.

On introducing a gas containing the coating elements, a gas discharge occurs in the process chamber. Thiscreates carbon and hydrogen atoms (ions and radicals) that form a dense coating on the tools and components. Varying the applied voltage influences the coating properties. 
1 Argon
2 Reactive gas
3 Components
4 Plasma sheath
5 High-frequency connection
6 Vacuum pump
For further information
Systems and processes
Home Sitemap Contact Search Legal Policy Imprint © œrlikon 2006-2010