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The technology is based on arc evaporation using pulse technology. The process can be run in pure oxygen atmosphere. Electron emission and plasma density are controlled by the pulse current.
With P3eTM technology it is possible to deposit any metal oxide (Al2O3, ZrO2, Cr2O3, Ta2O5, etc.) and combinations.
1 Oxygen O2
2 Arc sources (coating material)
3 Components / Tools
4 Power supply for pulsed cathodic arc evaporation
5 Power supply for high power pulsed substrate bias
6 Vacuum pump
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