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The PVD processes
PVD = Physical Vapour Deposition
PVD processing is carried out in high vacuum at temperatures between 150 and 500 °C.
The high-purity, solid coating material (metals such as titanium,
chromium and aluminium) is either evaporated by heat or by bombardment
with ions (sputtering). At the same time, a reactive gas (e.g. nitrogen
or a gas containing carbon) is introduced; it forms a compound with the
metal vapour and is deposited on the tools or components as a thin,
highly adherent coating. In order to obtain a uniform coating
thickness, the parts are rotated at uniform speed about several axes.
The properties of the coating (such as hardness, structure,
chemical and temperature resistance, adhesion) can be accurately
controlled.
The PVD processes include arc evaporation, sputtering, ion plating and enhanced sputtering.
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